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Lacking entry to EUV, DUV with multipatterning has been important to SMIC’s production of 7 nm node chips, together with AI chips for Huawei. Regarding DUV machines, government sources told CSIS that the efficiency thresholds would restrict machines at or above the performance of the Twinscan NXT 2000i, which means that not all argon fluoride immersion DUV instruments will likely be restricted. Government officials instructed CSIS that this will likely be most impactful when carried out by U.S. In the case of HBM, Reuters reported that future U.S.